| 摘要 |
<p>The present invention provides a resist composition which includes a polymeric compound which becomes a base resin which improves alkali-solubility by acid, and a polymer compound which includes repeating units derived from a styrene having a 1,1,1,3,3,3-hexafluoro-2-propanol group as a polymer additive. A photoresist film formed using the resist composition of the present invention can reduce the edge roughness (LWR) after development by reducing the generation of outgas from the resist film in EUV exposure and prevent blob defects on the resist film by making the surface of the resist film hydrophilic.</p> |
