发明名称 METHOD FOR GROWING GRAPHENE
摘要 PROBLEM TO BE SOLVED: To provide a method for growing graphene, allowing manufacture of an epitaxial graphene film with a wide area at low cost.SOLUTION: A metal film is formed on a single crystal silicon. The single crystal silicon and part of the metal film are reacted to cause epitaxial growth of a metallic silicide film on the single crystal silicon. The remainder of the metal film on the metallic silicide film is crystallized to form a single crystal metal film reflecting a plane direction of the metallic silicide film. Epitaxial growth of graphene is caused on the single crystal metal film.
申请公布号 JP2014043372(A) 申请公布日期 2014.03.13
申请号 JP20120186289 申请日期 2012.08.27
申请人 NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL & TECHNOLOGY 发明人 HAYASHI KENJIRO
分类号 C30B29/02;B01J23/755;C01B31/02;C23C16/26 主分类号 C30B29/02
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