发明名称 |
METHOD FOR GROWING GRAPHENE |
摘要 |
PROBLEM TO BE SOLVED: To provide a method for growing graphene, allowing manufacture of an epitaxial graphene film with a wide area at low cost.SOLUTION: A metal film is formed on a single crystal silicon. The single crystal silicon and part of the metal film are reacted to cause epitaxial growth of a metallic silicide film on the single crystal silicon. The remainder of the metal film on the metallic silicide film is crystallized to form a single crystal metal film reflecting a plane direction of the metallic silicide film. Epitaxial growth of graphene is caused on the single crystal metal film. |
申请公布号 |
JP2014043372(A) |
申请公布日期 |
2014.03.13 |
申请号 |
JP20120186289 |
申请日期 |
2012.08.27 |
申请人 |
NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL & TECHNOLOGY |
发明人 |
HAYASHI KENJIRO |
分类号 |
C30B29/02;B01J23/755;C01B31/02;C23C16/26 |
主分类号 |
C30B29/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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