发明名称 SEMICONDUCTOR DEVICE AND SEMICONDUCTOR INTEGRATED CIRCUIT DEVICE USING THE SAME
摘要 There is provided an MOSFET having a large current density, which can be mixed with a logic circuit, and is used in a circuit that conducts the operation of applying a negative voltage to a drain electrode. An electrode surrounded by an insulating film is formed, at an intermediate position of a gate electrode and a drain of the MOSFET formed on an SOI substrate having a drain electrode applied with a negative voltage, and the electrode is connected to the ground to prevent a withstand voltage from being lowered which is caused by an increase in impurity concentration of a drift region. A drift resistance is lowered to improve the current density.
申请公布号 US2014070314(A1) 申请公布日期 2014.03.13
申请号 US201313964223 申请日期 2013.08.12
申请人 HITACHI, LTD. 发明人 SHIRAKAWA SHINJI;SAKANO JUNICHI
分类号 H01L27/092 主分类号 H01L27/092
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