PHOTOSENSITIVE RESIN COMPOSITION FOR PHOTO SPACER, AND PHOTO SPACER

摘要

A photosensitive resin composition for a photo spacer is provided which exhibits excellent substrate adhesion properties, which is capable of forming a photo spacer exhibiting excellent elastic recovery and breaking strength, and with which little development residue is generated. This photosensitive resin composition for a photo spacer includes an acrylic resin as a binder polymer, said acrylic resin having repeating moieties having a ring structure in the main chain thereof, and repeating moieties having at least two oxyalkylene groups in a branched chain thereof. In one embodiment of the present invention, this photosensitive resin composition for a photo spacer further includes: a multifunctional monomer; a first photopolymerization initiator having a maximum absorption wavelength in the range of 290nm-380nm; and a second photopolymerization initiator having a maximum absorption wavelength in the range of 230nm-290-nm.