THIN FILM DEPOSITION APPARATUS

摘要

The present invention relates to an apparatus for depositing a thin film. The apparatus for depositing a thin film includes a chamber having a chamber body with a predetermined space and having an open upper portion and a chamber lid to open and close the open upper portion of the chamber body; a substrate moving part to move a plurality of substrates along a predetermined moving path; a plurality of gas supply parts to supply at least one of process gas and purge gas, and spaced apart from each other at predetermined intervals along the predetermined moving path; a heating part to heat the substrates; and a gas activating unit supported by one among the gas supply part, the chamber body, and the chamber lid to activate the process gas supplied from the gas supply part.