发明名称 |
Method and system for providing high magnetic flux saturation CoFe films |
摘要 |
A method and system plates CoFeX, where X is an insertion metal. The method and system include providing a plating solution including hydroxymethyl-p-tolylsulfone (HPT). The plating solution being configured to provide a CoFeX film having a high saturation magnetic flux density of greater than 2.3 Tesla and not more than 3 weight percent of X. The method and system also include plating the CoFeX film on a substrate in the plating solution. In some aspects, the plated CoFeX film may be used in structures such as main poles of a magnetic recording head. |
申请公布号 |
US8670211(B1) |
申请公布日期 |
2014.03.11 |
申请号 |
US201113164991 |
申请日期 |
2011.06.21 |
申请人 |
SUN MING;MEDINA JOSE A.;SASAKI KEITH Y.;JIANG MING;WESTERN DIGITAL (FREMONT), LLC |
发明人 |
SUN MING;MEDINA JOSE A.;SASAKI KEITH Y.;JIANG MING |
分类号 |
G11B5/127;C25D3/00 |
主分类号 |
G11B5/127 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|