发明名称 Devices with cavity-defined gates and methods of making the same
摘要 Disclosed are methods, systems and devices, including a method that includes the acts of forming a semiconductor fin, forming a sacrificial material adjacent the semiconductor fin, covering the sacrificial material with a dielectric material, forming a cavity by removing the sacrificial material from under the dielectric material, and forming a gate in the cavity.
申请公布号 US8669159(B2) 申请公布日期 2014.03.11
申请号 US201113028064 申请日期 2011.02.15
申请人 JUENGLING WERNER;MICRON TECHNOLOGIES, INC. 发明人 JUENGLING WERNER
分类号 H01L21/336 主分类号 H01L21/336
代理机构 代理人
主权项
地址