发明名称 |
POSITIVE-TYPE RESIST COMPOSITION |
摘要 |
<p>A positive-type resist composition according to the present invention includes a fluorine-containing aliphatic alcohol, a polymer, a vinyl compound and a photoacid generator, wherein the fluorine-containing aliphatic alcohol is a monohydric C2-C8 aliphatic alcohol in which the number of hydrogen atoms is equal to or less than the number of fluorine atoms. This positive-type resist composition has a small influence on organic materials, such as less dissolution and swelling of the organic materials, and can form a resist film on an organic polymer substrate etc. by a wet application process such that the resulting resist film or resist pattern shows high solvent resistance.</p> |
申请公布号 |
KR20140027478(A) |
申请公布日期 |
2014.03.06 |
申请号 |
KR20147001387 |
申请日期 |
2012.06.18 |
申请人 |
CENTRAL GLASS COMPANY, LIMITED |
发明人 |
TERUI YOSHIHARU;MORI TAKASHI;KOMORIYA HARUHIKO |
分类号 |
G03F7/039;C08F2/44;G03F7/004;H01L21/027 |
主分类号 |
G03F7/039 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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