发明名称 SEMICONDUCTOR BUFFER STRUCTURE, SEMICONDUCTOR DEVICE INCLUDING THE SAME, AND MANUFACTURING METHOD THEREOF
摘要 A semiconductor structure including a first nitride semiconductor layer, a second nitride semiconductor layer, and a third layer between the first nitride semiconductor layer and the second nitride semiconductor layer. The first nitride semiconductor layer has a first gallium composition ratio, the second nitride semiconductor layer has a second gallium composition ratio different from the first metal composition ratio, and the third layer has a third gallium composition ratio greater than at least one of the first gallium composition ratio or the second gallium composition ratio. The structure may also include a fourth layer for reducing tensile stress or increasing compression stress experienced by at least the second nitride semiconductor layer.
申请公布号 US2014061663(A1) 申请公布日期 2014.03.06
申请号 US201313837460 申请日期 2013.03.15
申请人 SAMSUNG ELECTRONICS CO., LTD 发明人 KIM JUN-YOUN;KIM JOO-SUNG;YANG MOON-SEUNG
分类号 H01L29/20;H01L21/02 主分类号 H01L29/20
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