| 摘要 |
<p>Provided is an evaporation source with which the effect of thermal fluctuation due to contact is not easily transmitted to a vapor deposition material, and with which the temperature distribution of the vapor deposition material can be made uniform, and the amount of evaporation of the vapor deposition material can be stabilized. This evaporation source comprises a crucible (2) filled with an evaporation material (1), a heating part (3) provided so as to surround this crucible (2), and a container (4) arranged so as to house the crucible (2) and the heating unit (3). The construction is such that crucible-receiving parts (5) are provided on the outside surface of the crucible at positions higher than the fill surface (1a) of the evaporation material (1) and lower than the position of the opening of the crucible (2), the crucible-receiving parts (5) are supported by crucible support parts (6) provided on the inside of the container (4), and the crucible (2) is housed in the container (4) with the outside base surface of the crucible (2) separated from the inside base surface of the container (4).</p> |
