发明名称 METHOD FOR MONITORING ION DISTRIBUTION IN PLASMA SHEATH AND APPARATUS FOR THEREOF
摘要 The present invention relates to a method for monitoring ion distribution in a plasma sheath and apparatus thereof. According to the present invention, provided is a method for monitoring ion distribution within a plasma sheath, comprising the steps of: receiving a first captured image of particles in a plasma chamber in a vacuum state; receiving a second captured image of particles in the plasma chamber when gas is injected into and power is applied to the plasma chamber; obtaining a first particle number distribution and a second particle number distribution according to gray scale values by using the grayscale values of pixels constituting each sheath region in the first and second captured images; obtaining a corrected second particle number distribution by deducting the first particle number distribution from the second particle number distribution based on the gray scale values; and monitoring ion distribution of the sheath area using the corrected second particle number distribution. According to the method for monitoring ion distribution in the plasma sheath, it is possible to monitor ion distribution in the sheath area easily in real time by using the grayscale values of pixels constituting the sheath area in the captured images of particles existing in the plasma chamber. [Reference numerals] (AA) START; (BB) END; (S310) Receiving a first captured image of particles in a plasma chamber in a vacuum state; (S320) Receiving a second captured image of particles in the plasma chamber in a plasma state; (S330) Obtaining a first particle number distribution and a second particle number distribution according to grayscale values by using the grayscale values of pixels constituting each sheath region in the first and second captured images; (S340) Obtaining a corrected second particle number distribution by deducting the first particle number distribution from the second particle number distribution based on the grayscale values; (S350) Monitoring ion distribution of the sheath area using the corrected second particle number distribution
申请公布号 KR20140026675(A) 申请公布日期 2014.03.06
申请号 KR20120091777 申请日期 2012.08.22
申请人 INDUSTRY-ACADEMIA COOPERATION GROUP OF SEJONG UNIVERSITY 发明人 KIM, BYUNG WHAN
分类号 H05H1/00;G01N21/00 主分类号 H05H1/00
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