DEVICE AND METHOD OF MEASURING SUBSTRATE TEMPERATURE, AND HEAT TREATMENT CHAMBER AND APPARATUS OF SUBSTRATE HAVING THE SAME

摘要

Disclosed are a device and a method of measuring substrate temperature, and a heat treatment chamber having the same and an apparatus and a method. According to the present invention, the device of measuring substrate temperature includes a pin thermocouple for measuring the temperature of a substrate which is mounted on lift pins, and is partly or totally buried in the lift pin which is provided in the upper part of each moving plate housing. The junction of the pin thermocouple is located to be separated from the lower surface of the substrate with a constant distance.