发明名称 PROTECTIVE LAYER FOR MULTILAYERS EXPOSED TO HARD X-RAYS
摘要 <p>An optical element for diffracting x-rays that includes a substrate, a diffraction structure applied to the substrate, the diffraction structure including an exterior surface facing away from the substrate and the diffraction structure capable of diffracting x-rays and a protective layer applied to the exterior surface.</p>
申请公布号 EP1464061(B1) 申请公布日期 2014.03.05
申请号 EP20020784361 申请日期 2002.10.31
申请人 RIGAKU INNOVATIVE TECHNOLOGIES, INC. 发明人 VERMAN, BORIS;JOENSEN, KARSTEN;PLATONOV, YURIY;SESHADRI, SRIVATSAN
分类号 G21K1/06 主分类号 G21K1/06
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