发明名称 Schottky diode employing recesses for elements of junction barrier array
摘要 The present disclosure generally relates to a Schottky diode that has a substrate, a drift layer provided over the substrate, and a Schottky layer provided over an active region of the substrate. A junction barrier array is provided in the drift layer just below the Schottky layer. The elements of the junction barrier array are generally doped regions in the drift layer. To increase the depth of these doped regions, individual recesses may be formed in the surface of the drift layer where the elements of the junction barrier array are to be formed. Once the recesses are formed in the drift layer, areas about and at the bottom of the recesses are doped to form the respective elements of the junction barrier array.
申请公布号 US8664665(B2) 申请公布日期 2014.03.04
申请号 US201113229752 申请日期 2011.09.11
申请人 HENNING JASON PATRICK;ZHANG QINGCHUN;RYU SEI-HYUNG;AGARWAL ANANT;PALMOUR JOHN WILLIAMS;ALLEN SCOTT;CREE, INC. 发明人 HENNING JASON PATRICK;ZHANG QINGCHUN;RYU SEI-HYUNG;AGARWAL ANANT;PALMOUR JOHN WILLIAMS;ALLEN SCOTT
分类号 H01L29/15 主分类号 H01L29/15
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