发明名称 PLOTTING STATE ADJUSTING METHOD AND DEVICE
摘要 It is possible to set an optical magnification capable of making a recording position shift amount with respect to Y direction of the plotting point formed by a micro mirror within an allowance range from the relationship between a Y-direction distance between mirror images obtained by projecting micro mirrors constituting a DMD onto a substrate, an inclination angle of the DMD, an image pattern recording pitch, and an optical magnification.
申请公布号 KR101369217(B1) 申请公布日期 2014.03.04
申请号 KR20087023227 申请日期 2007.03.16
申请人 发明人
分类号 H01L21/027 主分类号 H01L21/027
代理机构 代理人
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