发明名称 WORKPIECE POLISHING METHOD AND POLISHING LIQUID
摘要 PROBLEM TO BE SOLVED: To provide a rolling element manufacturing method capable of suppressing uneven coloring and glossiness on a surface, sufficiently removing damage generated during preprocessing of workpiece manufacturing, and efficiently obtaining a member of low surface roughness, a workpiece polishing method, polishing liquid, and a polishing device.SOLUTION: For workpiece polishing, abrasive grains including particles made of photocatalysts and having particle sizes of 140 to 550 nm, a fluorescent material, and a substance transmitting light to excite the photocatalyst and the fluorescent material, and solvents are used. A rolling element workpiece polishing device 1 includes a disk-like workpiece support part 20 for swingably supporting a workpiece W, and a disk-like polishing pad 30 disposed to be slid into contact with the surface of the workpiece W supported by the workpiece support part 20, and configured to polish the surface of the workpiece W via polishing liquid while being relatively rotated around a center axis with respect to the workpiece support part 20 to rotate the workpiece W.
申请公布号 JP2014037052(A) 申请公布日期 2014.02.27
申请号 JP20130171429 申请日期 2013.08.21
申请人 RITSUMEIKAN 发明人 TANAKA TAKESHI
分类号 B24B37/02;B24B37/00;B24B37/24;B24B37/26;C09G1/02;C09K3/14 主分类号 B24B37/02
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