发明名称 METHODS, DEVICES, AND MATERIALS FOR METALLIZATION
摘要 A method of making an electronic device which in one embodiment comprises providing a substrate, electrolessly depositing a barrier metal at least on portions of the substrate, and using wet chemistry such as electroless deposition to deposit a substantially gold-free wetting layer having solder wettability onto the barrier metal. An electronic device which in one embodiment comprises a metallization stack. The metallization stack comprises a barrier metal deposited electrolessly and a substantially gold-free wetting layer deposited on the barrier metal, and the wetting layer is wettable by solder.
申请公布号 US2014054776(A1) 申请公布日期 2014.02.27
申请号 US201313973382 申请日期 2013.08.22
申请人 LAM RESEARCH CORPORATION 发明人 KOLICS ARTUR;LEE WILLIAM T.;REDEKER FRITZ
分类号 H01L23/00 主分类号 H01L23/00
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