| 摘要 |
PROBLEM TO BE SOLVED: To provide a microlithography projection optical system, in particular, a projection objective system, a microlithography tool including the optical system, a microlithography manufacturing method for a fine structure constituent element employing the microlithography tool, and the fine structure constituent element produced by the method.SOLUTION: A microlithography projection optical system 1100 includes a plurality of optical elements 1110 to 1160 that are arranged so as to image eradiation having a wavelength λ at an image field in an image plane from an object field in an object plane 103, and has an entrance pupil located farther than 2.8 m from the object plane. A path of the eradiation passing through an optical system is characterized by a principal ray having an angle of 3° or greater with respect to a normal to the object plane. In particular, for an extreme ultraviolet (EUV) wavelength, the microlithography projection optical system enables a use of, specifically, a phase shift mask as an object to be imaged. |
