| 摘要 |
PROBLEM TO BE SOLVED: To provide a sample holder which uses a common electrostatic chuck and accurately performs electron beam exposure to wafers having various shapes, and to provide an electron beam exposure method which uses the sample holder.SOLUTION: A sample holder 10 is disposed between an electrostatic chuck 74 and a sample 50 that is smaller than an upper surface of the electrostatic chuck 74 and includes: a substrate 11 that is formed so as to have the same size as the upper surface of the electrostatic chuck 74; a sample placement part which is an upper surface of the substrate 11 and on which the sample 50 is placed; and a peripheral part that is a portion of the upper surface of the substrate 11 which excludes the sample placement part and in which a conductive material 13 is exposed. Charge-up of the peripheral part is prevented by using the sample holder 10. |
