| 摘要 |
PURPOSE:To provide high light resistance to a silver halide photographic sensitive material and to prevent deterioration in the whiteness of the ground by incorporating a specified compound into at least one silver halide emulsion layer in combination with the silver halide emulsion. CONSTITUTION:This silver halide photographic sensitive material has at least one silver halide emulsion layer on the support. The silver halide emulsion layer contains a compound represented by the formula in combination with the silver halide emulsion. In the formula, Cp is a coupler residue forming a dye image by the reaction of silver halide with the oxidized product of a color developing agent, T is a group bonding to the coupling position of Cp and capable of releasing LIG during or after elimination by the reaction with the oxidized product, LIG is a ligand capable of forming a complex compound and n=0 or 1. The sensitive material is provided with remarkably high light resistance and deterioration in the whiteness of the ground is prevented. |
