发明名称 |
STRUCTURE FOR GROWTH OF NITRIDE SEMICONDUCTOR LAYER, STACKED STRUCTURE, NITRIDE-BASED SEMICONDUCTOR ELEMENT, LIGHT SOURCE, AND MANUFACTURING METHOD FOR SAME |
摘要 |
<p>A structure for growth of a nitride semiconductor layer which is disclosed in this application includes: a sapphire substrate of which growing plane is an m -plane; and a plurality of ridge-shaped nitride semiconductor layers provided on the growing plane of the sapphire substrate, wherein a bottom surface of a recessed portion provided between respective ones of the plurality of ridge-shaped nitride semiconductor layers is the m -plane of the sapphire substrate, the growing plane of the plurality of ridge-shaped nitride semiconductor layers is an m -plane, and an absolute value of an angle between an extending direction of the plurality of ridge-shaped nitride semiconductor layers and a c -axis of the sapphire substrate is not less than 0° and not more than 35°.</p> |
申请公布号 |
EP2701183(A1) |
申请公布日期 |
2014.02.26 |
申请号 |
EP20120821910 |
申请日期 |
2012.08.03 |
申请人 |
PANASONIC CORPORATION |
发明人 |
CHOE,SONGBAEK;YOKOGAWA, TOSHIYA;INOUE, AKIRA;YAMADA, ATSUSHI |
分类号 |
H01L33/00;H01L33/12;H01L33/16;H01L33/20;H01L33/32 |
主分类号 |
H01L33/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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