发明名称 STRUCTURE FOR GROWTH OF NITRIDE SEMICONDUCTOR LAYER, STACKED STRUCTURE, NITRIDE-BASED SEMICONDUCTOR ELEMENT, LIGHT SOURCE, AND MANUFACTURING METHOD FOR SAME
摘要 <p>A structure for growth of a nitride semiconductor layer which is disclosed in this application includes: a sapphire substrate of which growing plane is an m -plane; and a plurality of ridge-shaped nitride semiconductor layers provided on the growing plane of the sapphire substrate, wherein a bottom surface of a recessed portion provided between respective ones of the plurality of ridge-shaped nitride semiconductor layers is the m -plane of the sapphire substrate, the growing plane of the plurality of ridge-shaped nitride semiconductor layers is an m -plane, and an absolute value of an angle between an extending direction of the plurality of ridge-shaped nitride semiconductor layers and a c -axis of the sapphire substrate is not less than 0° and not more than 35°.</p>
申请公布号 EP2701183(A1) 申请公布日期 2014.02.26
申请号 EP20120821910 申请日期 2012.08.03
申请人 PANASONIC CORPORATION 发明人 CHOE,SONGBAEK;YOKOGAWA, TOSHIYA;INOUE, AKIRA;YAMADA, ATSUSHI
分类号 H01L33/00;H01L33/12;H01L33/16;H01L33/20;H01L33/32 主分类号 H01L33/00
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