| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a substrate processing device capable of preventing abnormal discharge on a substrate from being caused. <P>SOLUTION: This substrate processing device 10 is provided with a disc-like shower head 24 having a ceiling electrode plate 25, a cooling plate 26, and an upper electrode support 27 which are laminated one by one, the upper electrode support 27 is connected to an upper high frequency power supply 30, the cooling plate 26 has a central buffer chamber 34 and a peripheral buffer chamber 35 in the inside thereof, two clamps 38 are disposed at locations corresponding to the central buffer chamber 34 in the upper electrode support 27, two clamps 40 are disposed at locations corresponding to the peripheral buffer chamber 35, the clamps 38, 40 are connected to gas supply systems 39, 41 respectively, the two clamps 38 are disposed for every 180°±3°on a circumference having the shower head as the center thereof, and the two clamps 40 are also disposed for every 180°±3°on a circumference having the shower head as the center thereof. <P>COPYRIGHT: (C)2012,JPO&INPIT</p> |
