| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an actinic ray-sensitive or radiation-sensitive resin composition which provides a pattern showing good exposure latitude (EL) and pattern profile in a pattern forming process with excimer laser light not only by normal exposure (dry exposure) but by immersion exposure, and to provide a method for forming a pattern using the composition. <P>SOLUTION: The actinic ray-sensitive or radiation-sensitive resin composition includes (A) a resin having a protecting group that leaves by an action of an acid to increase the solubility with an alkali developing solution, and (B) a compound generating an acid by irradiation with actinic rays or radiation, wherein the protecting group of the resin (A) has a polar group, and an acid generating from the compound (B) is expressed by formula (I). In formula (I), Xf independently represents a fluorine atom or an alkyl group substituted with at least one fluorine atom; R<SP>1</SP>and R<SP>2</SP>each independently represents a hydrogen atom, a fluorine atom, an alkyl group or a group selected from alkyl groups substituted with at least one fluorine atom, when a plurality of R<SP>1</SP>or R<SP>2</SP>are present, they may be identical or different from each other; L represents a single bond or a divalent connecting group, and when a plurality of L are present, they may be same or different from each other; A represents a group having a cyclic structure; x represents an integer of 1 to 20; and y and z each represents an integer of 0 to 10. <P>COPYRIGHT: (C)2010,JPO&INPIT |
