发明名称 |
CVD-Siemens monosilane reactor process with complete utilization of feed gases and total recycle |
摘要 |
The present invention relates to a monosilane (SiH4) and hydrogen recycle process/system for chemical vapor deposition (CVD) of monosilane-based CVD polysilicon. In particular, the present invention relates to the substantially complete silane utilization and unconverted (from the reactor) contamination-free complete silane and hydrogen recycle process of producing polysilicon chunk materials via the decomposition of gaseous silane precursors. |
申请公布号 |
US8657958(B2) |
申请公布日期 |
2014.02.25 |
申请号 |
US20100874873 |
申请日期 |
2010.09.02 |
申请人 |
REVANKAR VITHAL;LAHOTI SANJEEV;SAVI RESEARCH, INC. |
发明人 |
REVANKAR VITHAL;LAHOTI SANJEEV |
分类号 |
C23C16/442;C23C16/06;C23F1/00;H01L21/306 |
主分类号 |
C23C16/442 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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