发明名称 |
Supporting membranes on nanometer-scale self-assembled films |
摘要 |
Block copolymer lithography has emerged as an alternative lithographic method to achieve large-area, high-density patterns at resolutions near or beyond the limit of conventional lithographic techniques for the formation of bit patterned media and discrete track media. In one embodiment, a structure includes a plurality of nanostructures extending upwardly from a substrate and a porous membrane extending across upper ends of the plurality of nanostructures. Other systems and methods are disclosed as well. |
申请公布号 |
US8658271(B2) |
申请公布日期 |
2014.02.25 |
申请号 |
US201213482944 |
申请日期 |
2012.05.29 |
申请人 |
BOSWORTH JOAN K.;DOBISZ ELIZABETH A.;RUIZ RICARDO;ROSE DIT ROSE FRANCK D.;HGST NETHERLANDS B.V. |
发明人 |
BOSWORTH JOAN K.;DOBISZ ELIZABETH A.;RUIZ RICARDO;ROSE DIT ROSE FRANCK D. |
分类号 |
B32B5/00 |
主分类号 |
B32B5/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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