发明名称 EXPOSURE DEVICE AND EXPOSURE METHOD
摘要 PROBLEM TO BE SOLVED: To solve a problem such that a plasmonic lens is adhered on a substrate and so a degree of freedom of a pattern is small.SOLUTION: The exposure device for exposing an exposed member comprises: a light output part for outputting light; a reticle on which a pattern for radiating the light is formed; a lens member to which the light passing through the reticle is radiated and on which plural plasmonic lenses for outputting a pattern of a near-field light obtained by reducing the pattern are aligned; and a first driving part for driving, in a first driving direction, at least one of the reticle, the lens member and the exposed member to the other member.
申请公布号 JP2014036108(A) 申请公布日期 2014.02.24
申请号 JP20120176391 申请日期 2012.08.08
申请人 NIKON CORP 发明人 OKUHIRA YOSUKE
分类号 H01L21/027;G02B3/00;G02B19/00 主分类号 H01L21/027
代理机构 代理人
主权项
地址