| 摘要 |
PROBLEM TO BE SOLVED: To provide a method of correctly measuring a residual volume of vapor deposition material.SOLUTION: A vapor deposition apparatus includes: a process chamber in which an observation window is disposed at least partially; a crucible for housing vapor deposition material, the crucible being disposed on the lower wall of the process chamber such that the crucible overlaps the observation window in a first direction; a disk which is disposed between the observation window and the crucible, overlaps the observation window in the first direction, and rotates around a rotation axis directed to the first direction; a rotation unit which is connected to the process chamber and the disk to rotate the disk; a measurement sensor which is disposed outside of the process chamber, overlaps the observation window, the disk, and the crucible in the first direction, measures a distance to the vapor deposition material in the crucible, and measures the residual amount of the vapor deposition material. |
