发明名称 SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
摘要 PROBLEM TO BE SOLVED: To enhance the degree-of-freedom of arrangement of a device for determining the holding state of a substrate, and the degree-of-freedom of the execution time of holding state determination.SOLUTION: A substrate processing apparatus includes projectors (61, 71) for irradiating detection light toward a region where a substrate may exist when the substrate is held by a substrate holding member, and optical receivers (62, 72) receiving the detection light irradiated from the projector. Optical paths (64, 74) of the detection light from the projector toward the optical receiver pass through the components of the substrate processing apparatus, e.g., substrate peripheral members (20, 30, 31, 34, 38, and the like), provided so as to be located around a substrate held by the substrate holding member. The detection light has a wavelength that passes through the substrate peripheral members but does not pass through the substrate.
申请公布号 JP2014036204(A) 申请公布日期 2014.02.24
申请号 JP20120178371 申请日期 2012.08.10
申请人 TOKYO ELECTRON LTD 发明人 AIURA KAZUHIRO;ITO KIKO;HASHIMOTO YUSUKE;NAGAI TAKASHI
分类号 H01L21/304;H01L21/67;H01L21/683 主分类号 H01L21/304
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