HOT FORGING PROCESS FOR HIGH-PERFORMANCE TANTALUM TARGET MATERIAL

摘要

The present invention relates to a hot forging process for a high-performance tantalum target material, and the process thereof comprises the steps of: initially subjecting a tantalum ingot to a first forging by a cold forging method, subsequently washing with an acid, and heat-treating; then subjecting the same to a second forging by a hot forging method, again washing with an acid and heat-treating; and then subjecting the same to a third forging by a hot forging method. The present invention corresponds to subjecting a large-diameter (a diameter larger than or equal to 160 mm) tantalum ingot for a high-performance tantalum target material to forging by combining cold forging and hot forging processes, together with a suitable heat treatment process so as to obtain the grain size and textural composition required for the product. The rolled blank material produced by the present invention can be used to obtain a high-performance tantalum target material which has a predominant and uniform texture (110) in the thickness direction of the target material and satisfies the use requirements for high-end sputtering base stations; compared with a common tantalum target material, the high-performance tantalum target material not only achieves the textural composition on which the (110) texture is predominant in the thickness direction (110) of the target material, but also provides a higher requirement of uniformity of the texture, thus ensuring a consistent sputtering rate during use.