发明名称 METHOD FOR FORMING FUNCTIONAL PATTERN, AND FUNCTIONAL DEVICE
摘要 The present invention relates to methods for directly forming a selective functional pattern on the surface of a substrate, which are being studied actively in recent years. In particular, the present invention: relates to electric/electronic elements and micro-contact printing techniques that are applied, for example, to modifications for imparting excellent design aesthetics to resin substrates or to mounting boards formed by plating; provides a novel means for the formation of functional patterns, which are becoming even finer and more sophisticated, and the direct formation of patterns on, for example, electric/electronic elements, printed electronic devices, and biochips; improves the quality and reliability thereof; and achieves cost reduction. The present invention also contributes greatly to savings in resources and energy.
申请公布号 KR20140020831(A) 申请公布日期 2014.02.19
申请号 KR20137012308 申请日期 2011.11.07
申请人 DIC CORPORATION;KUGIMIYA KOICHI 发明人 KUGIMIYA KOICHI
分类号 C23C18/22;B41M1/10;H05K3/18;H05K3/38 主分类号 C23C18/22
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