发明名称 Retainer ring for polishing wafer and Method of manufacturing the same
摘要 A retainer ring which holds an object to be polished according to an embodiment of the present invention comprises: a metal ring (10) including a plurality of through-holes (15) which is formed around one circle at predetermined intervals; inserting pins (20) which are coupled into the through-holes (15) of the metal ring (10) and includes a stepped edge (24) at one part of a body (21); and a resin (30) which covers the metal ring (10) including the inserting ring (20) and forms an external surface. As a result, a resin flow can be well maintained during an insert injection process for the retainer ring, thereby preventing detects as well as facilitating the workability of after-treatment such as cutting and tapping after injection.
申请公布号 KR101364089(B1) 申请公布日期 2014.02.19
申请号 KR20120068793 申请日期 2012.06.26
申请人 发明人
分类号 H01L21/304 主分类号 H01L21/304
代理机构 代理人
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