SEMICONDUCTOR WAFER COMPOSED OF MONOCRYSTALLINE SILICON AND METHOD FOR PRODUCING IT

摘要

Disclosed are a semiconductor wafer with monocrystal silicon and a generating method thereof. The present invention relates to the semiconductor wafer with the monocrystal silicon and the generating method thereof. The semiconductor wafer comprises a DZ area and an area having a BMD defect. The DZ area is extended from a front side of the semiconductor wafer to a bulk of the semiconductor wafer without the BMD defect. The area having the BMD defect is additionally extended from the DZ area to the bulk of the semiconductor wafer. The generating method comprises a step for pulling silicon single crystal according to a czochralski method; a step for processing single crystal to form a monocrystal substrate wafer with silicon; a step for rapidly heating and cooling the substrate wafer; a step for slowly heating the substrate wafer; and a step for maintaining the substrate during a predetermined period at a predetermined temperature.