MANUFACTURING METHOD OF TEMPLATE FOR IMPRINT

摘要

PROBLEM TO BE SOLVED: To provide a manufacturing method of a template for nanoimprint by which a fine template of half pitch 1x nm class can be prepared without elongating a pattern drawing time.SOLUTION: The manufacturing method of a template for nanoimprint comprises steps of: forming a metallic thin film on an optically transmissive substrate; forming a resist pattern thereon; slimming the resist pattern; forming a coat film to cover the resist pattern and the metallic thin film; exposing the resist pattern and the metallic thin film by etching back; removing the resist pattern while leaving part of the coat film on a resist pattern side face for a side-wall mask; etching the metallic thin film with the side-wall mask to form a metallic thin film pattern; removing the side-wall mask; etching the optically transmissive substrate while using the metallic thin film pattern as a mask, thereby forming a concave-and-convex pattern; and removing the metallic thin film pattern.