LITHOGRAPHY SYSTEM, CLAMPING METHOD, AND WAFER TABLE

摘要

PROBLEM TO BE SOLVED: To provide means to clamp a target in a lithography system for projecting an image or an image pattern on a target such as a wafer.SOLUTION: Clamp means has a layer of fixing liquid 3 which is included in a predetermined thickness h between a target 1 and a target table 2 so that pressure drop (&Dgr;Pcap) may occur by material of liquid and materials of respective contact surfaces A, B of the target 1 and the target table 2 between the target 1 and the target table 2.