发明名称 |
METHOD FOR CREATING A CRYSTALLINE AREA OF METAL, IN PARTICULAR IN AN INTEGRATED CIRCUIT |
摘要 |
The method comprises affixing a thin sheet of crystal (8) onto metal (6) of same type as the sheet but amorphous or of small grain size, deposited in trenches of a substrate (1) to form interconnect lines for example. Annealing progressively imposes the crystalline structure of the sheet onto the lines. When the crystal (8) is removed, highly conductive crystalline lines are obtained since the grains thereof have been greatly enlarged. |
申请公布号 |
EP2449584(B1) |
申请公布日期 |
2014.02.12 |
申请号 |
EP20100726545 |
申请日期 |
2010.07.01 |
申请人 |
COMMISSARIAT A L'ENERGIE ATOMIQUE ET AUX ENERGIESALTERNATIVES |
发明人 |
CAYRON, CYRIL;MAITREJEAN, SYLVAIN |
分类号 |
H01L21/768 |
主分类号 |
H01L21/768 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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