| 摘要 |
<p>A deposition apparatus includes a process chamber including an observing window (10), a crucible (200) disposed in the process chamber to overlap with the observing window (10) in a first direction, a disc (300) disposed between the observing window (10) and the crucible (200) to overlap with the observing window (10) in the first direction and rotated with respect to the first direction, a rotation unit coupled to the process chamber and the disc to rotate the disc, a deposition preventing plate disposed between the disc and the crucible and provided with an opening formed therethrough and overlapped with the observing window in the first direction, and a measuring sensor (500) disposed outside the process chamber to overlap with the observing window, the disc, and the crucible in the first direction. The measuring sensor (500) senses a distance between the deposition material and the measuring sensor to measure a residual amount of the deposition material.</p> |
