METHOD FOR PROCESSING SILICON MATERIAL

摘要

The invention relates to a method for processing surface-contaminated silicon material which has a surface contamination of 1 ppb - 1000 ppm based on the weight of silicon and is present in a material mixture, comprising the process steps, in any sequence, of a) removing material adhering on the surface of the silicon material by screening off the material mixture, b) separating electrically conductive coarse particles from the material mixture and c) removing visually perceptible extraneous material and highly oxidized silicon material from the material mixture.