| 发明名称 |
Polishing pad of polishing system |
| 摘要 |
A polishing pad of a polishing system is mountable to a polishing plate and has a predetermined channel pattern so as to allow a polishing liquid supplied from a polishing liquid supplier to move on a polishing surface. The channel pattern has at least two kinds of patterns. |
| 申请公布号 |
US8647178(B2) |
申请公布日期 |
2014.02.11 |
| 申请号 |
US201313769029 |
申请日期 |
2013.02.15 |
| 申请人 |
LG CHEM, LTD. |
发明人 |
MIN KYOUNG-HOON;IM YE-HOON;LEE DAE-YEON;SONG JAE-IK;PARK SU-CHAN |
| 分类号 |
B24D11/00 |
主分类号 |
B24D11/00 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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