发明名称 |
Substrate treating apparatus |
摘要 |
A substrate processing apparatus which holds and rotates a substrate substantially horizontally; having a control unit which controls a rinsing liquid supply mechanism for supplying a rinsing liquid onto the substrate; a gas knife mechanism that sprays gas onto the substrate to form a gas spraying zone and scans the entire substrate without rotating the substrate; a rinsing liquid mechanism for supplying a rinsing liquid onto the substrate at its area downstream from the gas spraying zone; and a drying unit for drying the substrate by rotating the substrate. |
申请公布号 |
US8646469(B2) |
申请公布日期 |
2014.02.11 |
申请号 |
US201313828015 |
申请日期 |
2013.03.14 |
申请人 |
DAINIPPON SCREEN MFG. CO., LTD. |
发明人 |
ARAKI HIROYUKI;TOKURI KENTARO |
分类号 |
B08B3/00 |
主分类号 |
B08B3/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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