发明名称 Process control apparatus and laser processing apparatus
摘要 A process control apparatus controls a focus position of a laser beam, while a laser processing mechanism converges the laser beam into a predetermined focus position and performs a laser processing on a workpiece. The process control apparatus includes: a calculator that, based on the magnitude of an output of the laser beam that changes during the laser processing, calculates a change amount of a positional deviation of the focus position in an optical axis direction that changes during the laser processing at a laser beam radiation position; and a control unit that, based on the change amount of the positional deviation that has been calculated by the calculator, controls the focus position of the laser beam during the laser processing so as to resolve the positional deviation of the focus position.
申请公布号 US8648279(B2) 申请公布日期 2014.02.11
申请号 US20090936120 申请日期 2009.04.03
申请人 TAKAHASHI KEIJI;MUKAE TOMONORI;YOKOI SHIGERU;YAMAMOTO TATSUYA;MITSUBISHI ELECTRIC CORPORATION 发明人 TAKAHASHI KEIJI;MUKAE TOMONORI;YOKOI SHIGERU;YAMAMOTO TATSUYA
分类号 B23K26/04 主分类号 B23K26/04
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