| 摘要 |
The present invention relates to an EUV light generating device with a stage. The present invention comprises a laser source, a tunable laser mirror (TLM), a focusing mirror (FM), a gas cell, a vacuum chamber, a plate, a sensor unit, and a control terminal. The laser source outputs laser. The TLM reflects a laser beam outputted from the laser source. The FM focuses the laser beam. The gas cell generates extreme ultraviolet by forming plasma which is generated by the laser beam and reaction gas. The vacuum chamber receives the TLM, the FM, and the gas cell in a vacuum state. The plate supports the laser source and the vacuum chamber or only supports the laser source. The sensor unit detects the position of the EUV light outputted from the vacuum chamber by moving the stage. The control terminal controls beam arrangement by driving the stage according to information detected in the sensor unit. The present invention is provided to precisely control the position, the focusing, and the intensity of the light in EUV light generation with various light detection units. [Reference numerals] (100) Laser source; (200) Vacuum chamber; (500) Sensor unit; (510) Control terminal |
