| 摘要 |
In an exposure method for performing an injection exposure on a substrate held by a substrate stage in every shot region in a first direction, the surface position of an exposure region is premeasured before the exposure region reaches the irradiation region of exposure light on the substrate. The movement of the substrate stage for changing the shot region to performing the injection exposure includes the first movement of the substrate stage moving along a curved path and the second movement of the substrate stage moving straightly in the first direction. If the movement of the substrate stage is the first movement, the surface position is premeasured, and then a premeasured position in the shot region is overlapped with the shot regions. [Reference numerals] (AA) One shot; (BB) Next shot; (CC) Focus sensor |
