发明名称 DEFECT INSPECTION METHOD, AND DEFECT INSPECTION DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a defect inspection method by which an error defect or an undetected defect can be suppressed efficiently.SOLUTION: In a defect inspection method in which while sequentially moving a defect candidate image 300 along an alignment sequence, real ghost processing comparison is performed between first and second reference images 410, 420, which are located at the front and rear of each of a defect candidate image 300 and the defect candidate image so as to detect a defect part 30 in the defect candidate image; when the defect part 30 is detected, difference processing between the first and second reference images is performed so as to generate a reference difference image 700; in accordance with whether or not a pixel of reference difference image is equal to or lower than a stain threshold value of a prescribed gray level difference, it is determined whether or not both of the first and second reference images are a pure reference image 400p without a defect part 40, or whether either of them is a stain reference image 400s having a defect part; and in accordance with a determination result, the reference image is changed from the first and second reference images located each at the front and rear of defect candidate image to a pre-stored pure reference image having no defect part.
申请公布号 JP2014025763(A) 申请公布日期 2014.02.06
申请号 JP20120165129 申请日期 2012.07.25
申请人 HITACHI HIGH-TECHNOLOGIES CORP 发明人 KIN HIDENORI;DOI AYUMI;HIROI TAKASHI
分类号 G01N21/956;G01N23/225;G06T1/00 主分类号 G01N21/956
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