发明名称 MATCHING PROCESSOR, MATCHING PROCESSING METHOD AND INSPECTION APPARATUS USING THE SAME
摘要 PROBLEM TO BE SOLVED: To provide an inspection apparatus capable of outputting a precise matching position even when a visual deviation is large between a template and an image to be searched.SOLUTION: The inspection apparatus which performs pattern matching with respect to an image to be searched includes: a feature rejoin extraction processing section that extracts a feature amount from a template image obtained for learning; a feature amount extraction processing section that extracts a feature amount from an obtained image to be searched for learning; a feature amount calculation processing section that calculates a relative feature amount between the template image and the image to be searched from the feature amount extracted from the template image and the feature amount extracted from the image to be searched; a learning processing section that calculates an identification boundary for identifying the state of the marching by using the plural mutual feature amounts; and a processing section that calculates the plural mutual feature amount obtained from an image obtained from an object to be inspected. The inspection apparatus performs matching between a template image to be inspected and an image to be searched by using the plural mutual feature amounts and the identification boundary.
申请公布号 JP2014026521(A) 申请公布日期 2014.02.06
申请号 JP20120167363 申请日期 2012.07.27
申请人 HITACHI HIGH-TECHNOLOGIES CORP 发明人 NAGATOMO WATARU;ABE YUICHI;USHIBA HIDEYUKI
分类号 G06T7/00 主分类号 G06T7/00
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