发明名称 METHOD OF DIFFERENTIAL COUNTER ELECTRODE TUNING IN AN RF PLASMA REACTOR
摘要 A method of controlling distribution of a plasma parameter in a plasma reactor having an RF-driven electrode and two (or more) counter electrodes opposite the RF driven electrode and facing different portions of the process zones. The method includes providing two (or more) variable reactances connected between respective ones of the counter electrodes and ground, and governing the variable reactances to change distribution of a plasma parameter such as plasma ion density or ion energy.
申请公布号 US2014034612(A1) 申请公布日期 2014.02.06
申请号 US201313958898 申请日期 2013.08.05
申请人 APPLIED MATERIALS, INC. 发明人 YANG YANG;RAMASWAMY KARTIK;COLLINS KENNETH S.;LANE STEVEN;BUCHBERGER, JR. DOUGLAS A.;WONG LAWRENCE;MISRA NIPUN
分类号 H01J37/32 主分类号 H01J37/32
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