发明名称 |
MEASUREMENT OF THE POSITION OF A RADIATION BEAM SPOT IN LITHOGRAPHY |
摘要 |
<p>A radiation spot measurement system for a lithographic apparatus, the system having a target onto which a radiation system of the lithographic apparatus may project spots of radiation for a measurement process, the target having a measurement target. The system further includes a radiation detector to detect radiation from one of the spots, and a controller to receive information from the radiation detector and to determine the position of the spot of radiation relative to an intended position of the spot of radiation.</p> |
申请公布号 |
EP2691811(A1) |
申请公布日期 |
2014.02.05 |
申请号 |
EP20120708271 |
申请日期 |
2012.02.22 |
申请人 |
ASML NETHERLANDS B.V. |
发明人 |
PEETERS, FELIX;BENSCHOP, JOZEF;RENKENS, MICHAEL;VAN BAARS, GREGOR;DEKKERS, JEROEN |
分类号 |
G03F7/20 |
主分类号 |
G03F7/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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