发明名称 MEASUREMENT OF THE POSITION OF A RADIATION BEAM SPOT IN LITHOGRAPHY
摘要 <p>A radiation spot measurement system for a lithographic apparatus, the system having a target onto which a radiation system of the lithographic apparatus may project spots of radiation for a measurement process, the target having a measurement target. The system further includes a radiation detector to detect radiation from one of the spots, and a controller to receive information from the radiation detector and to determine the position of the spot of radiation relative to an intended position of the spot of radiation.</p>
申请公布号 EP2691811(A1) 申请公布日期 2014.02.05
申请号 EP20120708271 申请日期 2012.02.22
申请人 ASML NETHERLANDS B.V. 发明人 PEETERS, FELIX;BENSCHOP, JOZEF;RENKENS, MICHAEL;VAN BAARS, GREGOR;DEKKERS, JEROEN
分类号 G03F7/20 主分类号 G03F7/20
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