| 摘要 |
Provided are a liquid processing apparatus capable of performing a cleaning process on a region except the peripheral region of a drain part in a purge line and a cleaning method. A liquid processing apparatus (10) includes a purge part (76) prepared near a drain part (71 to 74) and discharging the atmosphere of a substrate (W) hold by a substrate holding part (52), a purge path forming member (66) forming a purge path (77) connected to the purge part (76), a first cleaning part (90) supplying a cleaning solution to the purge path formation member (66) in the purge path (77). |
