发明名称 SUBSTRATE PROCESSING APPARATUS AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE
摘要 A substrate processing apparatus reduces over-heating of a substrate transfer robot and suppresses deterioration of reliability or lifespan of the substrate transfer robot. The substrate processing apparatus includes a transfer chamber having a substrate transferred thereinto under a negative pressure; a process chamber connected to the transfer chamber and configured to heat the substrate; a transfer robot installed in the transfer chamber and configured to transfer the substrate into and out of the process chamber; and a cooling unit configured to cool an inner wall of the transfer chamber.
申请公布号 KR101356194(B1) 申请公布日期 2014.02.04
申请号 KR20110073406 申请日期 2011.07.25
申请人 发明人
分类号 H01L21/677;H01L21/68 主分类号 H01L21/677
代理机构 代理人
主权项
地址
您可能感兴趣的专利