发明名称 SUBSTRATE PROCESSING METHOD, SUBSTRATE PROCESSING DEVICE AND STORAGE MEDIUM
摘要 PROBLEM TO BE SOLVED: To provide a substrate processing method capable of suppressing volatilization of a fluorine-containing organic solvent for drying prevention until a substrate is carried in a processing container, and decomposition of the fluorine-containing organic solvent in the processing container.SOLUTION: A substrate W having a surface covered with a first fluorine-containing organic solvent is carried in a processing container 31, and a high pressure fluid using a second fluorine-containing organic solvent, having a boiling point lower than that of the first fluorine-containing organic solvent, as a raw material is supplied to the processing container 31. A high pressure fluid atmosphere of a mixture of the first fluorine-containing organic solvent and second fluorine-containing organic solvent is formed in the processing container 31, the first fluorine-containing organic solvent covering the surface of the substrate is removed, and the fluid in the processing container 31 is discharged in the state of high pressure fluid or gas thus obtaining a dried substrate W.
申请公布号 JP2014022566(A) 申请公布日期 2014.02.03
申请号 JP20120159850 申请日期 2012.07.18
申请人 TOSHIBA CORP;TOKYO ELECTRON LTD 发明人 HAYASHI HIDEKAZU;SATO YOHEI;OGUCHI HISASHI;TOMITA HIROSHI;MITSUOKA KAZUYUKI;YO HAJIME;ONO HIROMOTO;ORII TAKEHIKO;TOSHIMA TAKAYUKI
分类号 H01L21/304 主分类号 H01L21/304
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