| 发明名称 |
HIGH CONDUCTIVITY ELECTROSTATIC CHUCK |
| 摘要 |
<p>In accordance with an embodiment of the invention, there is provided an electrostatic chuck comprising a conductive path covering at least a portion of a workpiece-contacting surface of a gas seal ring of the electrostatic chuck, the conductive path comprising at least a portion of an electrical path to ground; and a main field area of a workpiece-contacting surface of the electrostatic chuck comprising a surface resistivity in the range of from about 108 to about 1012 ohms per square.</p> |
| 申请公布号 |
KR20140012613(A) |
申请公布日期 |
2014.02.03 |
| 申请号 |
KR20137008752 |
申请日期 |
2011.09.08 |
| 申请人 |
ENTEGRIS, INC.;VARIAN SEMICONDUCTOR EQUIPMENT ASSOCIATES, INC. |
发明人 |
SUURONEN DAVID;STONE LYUDMILA;BLAKE JULIAN;STONE DALE K.;COOKE RICHARD A.;DONNELL STEVEN;VENKATRAMAN CHANDRA |
| 分类号 |
H01L21/683;B23Q3/15;H01L21/687;H02N13/00 |
主分类号 |
H01L21/683 |
| 代理机构 |
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代理人 |
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| 主权项 |
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